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MANDELIC EXFOLIATING BAR - EUCALYPTUS

AED 100.00

The physical and chemical approach provides a thorough yet gentle exfoliation. The chemical exfoliants loosen dead skin on the skin’s surface + the gentle physical exfoliation gently buffs away excess debris, dirt, and oil. good for dry, patchy areas, including elbows, knees, and heels.  Why you need it:This balanced formula...

The physical and chemical approach provides a thorough yet gentle exfoliation. The chemical exfoliants loosen dead skin on the skin’s surface + the gentle physical exfoliation gently buffs away excess debris, dirt, and oil. good for dry, patchy areas, including elbows, knees, and heels. 

Why you need it:
This balanced formula acts like a serum to exfoliate and buff away dead skin, while maintaining its moisture, leaving it cleansed while also looking polished and refreshed/ Triple-milled for a smoother texture + creamier lather for a satisfying cleanse.

Good for:

- Rough, bumpy skin. dry, patchy skin.
- Rough elbows, knees, and feet.
- Buffing away waterproof sunscreen.
- Prepping skin for shaving.
- Regular exfoliation removes dead skin and clears the hair's path, helping to prevent ingrown hairs.*

How to Use:

Massage wet bar onto skin, creating a mild, gentle lather. rinse clean. The intensity of the exfoliation can be customized to your preferred pressure. follow with Malin+Goetz body moisturizer. gentle enough for daily use, if needed.

Experience all 3 Bar: 
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Sodium Palmate, Sodium Palm Kernelate, Water / Eau / Aqua, Glycerin, Hydrogenated Vegetable Oil, Pumice, Simmondsia Chinensis (Jojoba) Seed Powder, Eucalyptus Globulus Leaf Oil, Sodium Cocoyl Isethionate, Sodium Gluconate, Mentha Piperita (Peppermint) Oil, Butyrospermum Parkii (Shea) Butter, Palm Acid, Mandelic Acid, Sodium Chloride, Polyglyceryl-4 Laurate, Palm Kernel Acid, Titanium Dioxide (CI 77891), Ascorbic Acid, Simmondsia Chinensis (Jojoba) Seed Oil, Sodium Hyaluronate, Tocopheryl Acetate, Lactic Acid, Iron Oxides (CI 77492), Limonene, Carbon (CI 77268:1), Chlorophyllin-Copper Complex (CI 75810).